We provide customized photomask blanks solutions for our customers.
The spin-coated chrome plate is manufactured on a high-cleanliness substrate by depositing chrome oxynitride-chrome nitride-chrome oxynitride thin films using DC magnetron sputtering technology, followed by applying a layer of photoresist via spin coating technology. It serves as a photosensitive material for the production of fine-processing photomasks. Mainly applied in:
- New flat panel display devices (LCD-STN, LCD-CSTN, LCD-TFT, CF, OLED, TP, PDP, etc.)
- Integrated circuits (LSI, VLSI and TR, Discrete Devices, LED, MEMS, IC-Bumping)
- Fine optics industry (optical devices, encoders, correction plates, gratings, optics)
- Circuit board related (PCB-HDI, FPC, Lead Frame)
01
LRC Low Reflective Chrome Photomask Blank
Features an optimized low-reflective chrome (LRC) coating with visible-light reflectivity of approximately 5–13% (typically <10% @ 450–632 nm), effectively suppressing standing waves, ghosting, and stray light. Delivers ultra-high contrast and pattern clarity, ideal for high-precision lithography, critical mask alignment, and advanced micro/nano fabrication applications.
02
MRC Mid Reflective Chrome Photomask Blank
Standard balanced mid-reflective chrome (MRC) coating with visible-light reflectivity of approximately 20–40% (typically ~33% @ 436–450 nm), offering the best combination of optical performance and cost. The most widely used specification in the industry, perfect for general lithography processes, prototyping, and volume production.
03
MHRC High Reflective Chrome Photomask Blank
High-reflective chrome (HRC) surface design with visible-light reflectivity >48–75% (typically 60–70%), providing strong and stable optical signal return. Specifically optimized for reflective-mode applications such as precision encoder discs, optical sensors, and hybrid/reflective optical systems requiring maximum signal strength.
