Photo Reticle

Our Laser Maskless Lithography Equipment

At Photo Reticle, our Laser Maskless Lithography equipment offers unparalleled precision and efficiency, providing a highly flexible solution for patterning microstructures onto a variety of substrates. This cutting-edge technology uses vision-recognition systems and computer-driven control for precise pattern placement, compensating for distortion and alignment errors to ensure exceptional accuracy and repeatability, surpassing traditional photomask-based lithography.

This laser-based approach allows for fine-tuned, high-precision patterning without the need for photomasks, making it faster, more cost-effective, and ideal for low-volume production and prototype development. Our Laser Maskless Lithography system delivers sub-micron resolution, capable of intricate designs on materials such as glass, silicon, and various polymers.

This laser-based approach allows for fine-tuned, high-precision patterning without the need for photomasks, making it faster, more cost-effective, and ideal for low-volume production and prototype development. Our Laser Maskless Lithography system delivers sub-micron resolution, capable of intricate designs on materials such as glass, silicon, and various polymers.

Key Features:
Sub-micron Precision: Capable of achieving 1µm features with excellent edge fidelity.

No Photomasks Required: Eliminates the need for traditional photomasks, reducing costs and production time while enhancing design flexibility.

High Alignment Accuracy: Achieves <= 500 nm alignment precision for multi-layer applications.

Customizable Patterning: Perfect for prototyping and low-volume production, capable of creating complex, high-resolution patterns.

Fast Production Speed: Writing speed up to 1000 mm/min, ensuring quick turnaround times for custom applications.

Applications for Your Engineering Solutions

Our Laser Maskless Lithography equipment is versatile and can be applied to a variety of industries and materials, including but not limited to:

Semiconductor Manufacturing: Ideal for the development of custom photomasks, reticles, and integrated circuits.

Microfluidics & Lab-on-a-Chip: Precision patterning for complex fluidic networks used in medical and analytical devices.

Glass & Silicon Substrates: High-resolution patterning for various glass types (e.g., Gorilla glass, Sapphire glass) and silicon wafers for electronics and optical applications.

MEMS Devices: Creating fine microstructures for sensors, actuators, and other micro-electromechanical systems.

Optical Devices: Custom optical elements and components for the photonics industry.

Prototyping and Low-Volume Production: Ideal for fast iterations and custom designs, especially in industries such as automotive, medical devices, and consumer electronics.

At Photo Reticle, we are committed to providing highly customized services tailored to your engineering needs. Whether you’re working with custom substrates, unique materials, or require specific design iterations, our Laser Maskless Lithography system can be adapted to meet your exact specifications.