Build fine optical patterns on glass for masks, discs, scales, reticles and custom components.
Glass preparation, coating and patterning take place here. Laser direct writing creates the fine features; inspection checks the finished pattern before it leaves production.
How we make
A typical manufacturing route for chrome-patterned encoder discs, reticles, scales and targets. The starting material and process steps are selected for each drawing.
Select, polish and clean the glass to the specified dimensions and surface requirements.
Deposit the chromium film with thickness and optical properties defined for the product.
Apply a uniform photoresist layer suited to the patterning process.
Bake the coated substrate to remove solvent and prepare the resist for exposure.
Use laser direct writing or mask exposure according to the product route.
Develop the exposed resist to reveal the pattern for subsequent etching.
Etch the exposed chromium to transfer the resist pattern into the film.
Remove the remaining resist and clean the patterned surface.
Inspect dimensions, pattern features, defects and surface condition against the agreed criteria.
Exposure equipment for replicated pattern transfer
This exposure route is suited to development and production of small and medium-scale integrated circuits, semiconductor devices and surface acoustic wave devices. It combines double-sided alignment with a pneumatic system, vacuum piping and precision mechanics for repeatable exposure handling.
The actual exposure dose, alignment result and repeatability depend on the substrate, resist stack, artwork, fixture and process window agreed for the project.
Photolithography transfers approved artwork into a functional film on a substrate for masks, encoders, reticles and test targets.
The route can include cleaning, coating, resist application, exposure, development, etching, stripping and inspection. Choose the steps for the required supply state.
Provide substrate material, dimensions, film stack, resist state and artwork so the required steps can be matched to the process.