Translate your artwork or engineering drawing into a controlled photolithography pattern.
Keep the engineering drawing and pattern artwork at the same revision. Record units, scale, origin, active area and whether the file represents clear regions or opaque chromium. A mirrored view must be identified by the viewing side, not left to interpretation.
Define line width and spacing independently. Encoder artwork also needs track radius, duty cycle and index position; calibration arrays need centre spacing and positional datums. The smallest drawn feature does not establish the accuracy of the complete part.
Check closed contours, overlapping shapes and isolated features before exposure. Separate the active pattern from alignment marks and identification areas. For multi-layer masks, use one coordinate convention and an explicit layer order across the set.
Record any agreed etch compensation separately from nominal design geometry. A released package should identify the approved artwork, drawing revision and critical inspection features, so later design changes can be assessed against a known baseline.
Pattern design and data preparation convert customer artwork into data that can be exposed and inspected.
Preserve units, scale, clear and opaque regions, film side, coordinates and revision. Check imported geometry against known dimensions.
A screenshot communicates appearance but may omit physical boundaries, scale, datums and fine detail. Supply dimensioned vector data and annotations as well.