Sputter Coating & Thin-Film Development

Develop and manufacture micro-nano films, functional coatings and multilayer stacks with controlled thickness, uniformity and defect density.

Sputter coating and functional thin films

Controlled thin-film stacks from development to repeat production.

Sputter coating is organized around film thickness, stack design, substrate temperature, optical response and defect control. The coating route and measurement plan are selected with the finished component and its working wavelength in mind.

Sputter coating line in a clean manufacturing environment

Sputter coating line for micro-nano and multilayer films

Our coating development scope covers 10–1,000 nm micro-nano films and multilayer stacks, with film uniformity targeted to ±1% when defined by the agreed measurement area. We also develop 0.1–20 µm coating processes where a thicker functional layer is required.

Film thickness development: 10–1,000 nm for micro-nano and multilayer stacks
Thicker coating development: 0.1–20 µm
Uniformity target: ±1% over the agreed measurement area
Low-defect-density coating development with high-precision measurement

Film families available for development include Cr, chromium oxide and chromium nitride; aluminium and Al-Cu alloys; Ag and Au; IR-transmissive ITO and AZO; and AR optical dielectric multilayers. Final film chemistry, thickness and acceptance values are confirmed for the application.

Products and technical guidance

Planning your project

Sputter coating and thin-film development select film materials and stacks for transmission, opacity, reflection or another specified function.

Define wavelength, thickness, uniformity and defects for the required optical mode; keep the listed film families and their conditions distinct.

Is an opaque chromium film automatically low-reflectance?

Blocking transmission and reducing reflection are different objectives. Specify the working wavelength and required transmission or reflection separately.